Indium (In) Sputtering Target
  • Attributes Name
    Metal sputtering target
  • Product Name
    Indium Sputtering Target
  • Element Symbol
  • Purity
  • Shape
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The indium sputtering target is a silver glossy gray target composed of high-purity indium (In). Its melting point is 156.61°C, boiling point is 2060°C, and density is 7.3 g/cm3. The texture is very soft, can be scored with nails, has strong plasticity, is malleable, can be pressed into sheets, and is a fusible metal. One of its distinguishing features is its ability to adhere to glass and other similar surfaces. Indium compounds evaporate under vacuum to form thin films in the production of electronic products and photovoltaic cells. Pure indium is used as a thin film layer in semiconductors.

Manufacturing process of indium sputtering target

Preparation-Melting-Chemical Analysis-Forging-Rolling-Annealing-Metallographic Inspection-Machining-Dimensional Inspection-Cleaning-Final Inspection-Packaging

Application of indium sputtering target

Indium sputtering target is used to coat the bearings of high-speed motors because it can evenly distribute the lubricant. Indium targets are also used in thin film deposition, decoration, semiconductors, displays, LED and photovoltaic devices, functional coatings, and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, and optical communications.

Indium is also used to make other electrical components such as rectifiers, thermistors and photoconductors. Indium can be used to make mirrors that have the same reflectivity as silver mirrors but will not fade. Indium is also used to make low melting point alloys. The alloy of 24% indium and 76% gallium is liquid at room temperature.

Chemical Specification:

The form below is a typical certificate of 99.999% pure Indium In sputtering target:

Related Sputtering Materials

In2O3 sputtering target

ln2Te3 sputtering target

In2O3/SnO2 90/10wt% sputtering target

InGaZnO4 sputtering target

In2O3/ZnO 90/10wt% sputtering target

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